APPARATUS FOR PROCESSING PLASMA SUBSTRATE OF FLAT PANEL DISPLAY TO EFFICIENTLY CARRY OUT ASHING AND ETCHING PROCESSES AND SHORTEN SUBSTRATE PROCESSING TIME

摘要

PURPOSE: An apparatus for processing a plasma substrate of a flat panel display is provided to efficiently carry out an ashing process or an etching processing using plasma and to shorten a period of time required for processing a single substrate by improving a substrate processing speed at the edge of a large substrate. CONSTITUTION: A substrate processing apparatus includes a vacuum chamber(210), an upper electrode set in the vacuum chamber, a lower electrode that is opposite to the upper electrode to form electric field together with the upper electrode and supports a substrate, and an exhauster(250) for exhausting remnants and sub-products of substrate processing. The apparatus further includes a front gas jetting unit(242) for jetting a substrate processing gas to the substrate, the first side gas jetting unit(244a) located on one of two sides of the vacuum chamber to jet the substrate processing gas to the substrate, and the second side gas jetting unit(244b) placed on the other side of the vacuum chamber to jet the substrate processing gas to the substrate.