| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processor in which the substrate of the object of a processing can sufficiently be processed. SOLUTION: The substrate processor 1 is provided with a spin chuck 10 which almost horizontally holds a wafer W, and a two fluid nozzle 2 supplying droplets of hydrofluoro ether (hereafter, referred to as "HFE") being inactive solvent of a fluorine system to the wafer W held by the spin chuck 10 so as to process it. The spin chuck 10 and the two fluid nozzle 2 are arranged in a chamber 3. A solvent collection tank 8 collecting HFE used for the processing of the wafer W and a solvent liquefying device 13 liquefying and collecting steam of HFE, which occurs in the chamber 3, are arranged outside the chamber 3. COPYRIGHT: (C)2005,JPO&NCIPI
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