发明名称 NOZZLE APPARATUS AND TREATMENT APPARATUS OF SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a nozzle apparatus which prevents diffusion to the surroundings of the mist produced when a substrate is treated with a treating liquid pressurized by pressurized air. SOLUTION: The nozzle apparatus is provided with a nozzle body 61, a mixing chamber disposed on the nozzle body, a jetting part which is disposed on the nozzle body and is communicated with the mixing chamber, first and second connection holes which are disposed on the nozzle body and feed the liquid to the mixing chamber, a third connection hole which is disposed on the nozzle body and supplies the pressurized air for pressurizing the liquid fed to the mixing chamber and jetting the pressurized liquid from the jetting part, and a cover body 81 which is disposed on the nozzle body and eliminates the liquid scattered to the surroundings of the nozzle body, among the liquid pressurized by the pressurized air and jetted toward the substrate from the jetting part. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005000722(A) 申请公布日期 2005.01.06
申请号 JP20030163691 申请日期 2003.06.09
申请人 SHIBAURA MECHATRONICS CORP 发明人 ISO AKINORI
分类号 B05B15/04;B05B7/04;B05C11/08;H01L21/304;(IPC1-7):B05B7/04 主分类号 B05B15/04
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