PHOTOLITHOGRAPHIC METHOD, METHOD OF MANUFACTURING PIEZOELECTRIC OSCILLATING PIECE, METHOD OF MANUFACTURING PIEZOELECTRIC DEVICE, PIEZOELECTRIC OSCILLATING PIECE, SEMICONDUCTOR DEVICE, ELECTRONIC PART, PIEZOELECTRIC DEVICE, ELECTRONIC APPARATUS AND PORTABLE TELEPHONE

摘要

PROBLEM TO BE SOLVED: To provide a photolithographic method, etc. for forming a uniform and thin resist coat formed on an electrode film of a substrate.

SOLUTION: The method comprises a step of coating resist grains 132b on a substrate 71 covered with an electrode film 22, a step of gasifying a solvent 146 for solving the resist grains 132b to produce an evaporation gas G of the solvent, a step of solving the resist grains 132b by the gas G of the solvent to form an electrode resist 137 on the electrode film 22 after placing the substrate 71 in the atmosphere of the solvent evaporation gas G, and a step of forming a resist pattern corresponding to an electrode pattern on the substrate 71 by exposing the electrode resist 137 formed on the electrode film 22 of the substrate 71 with a corresponding mask set on the substrate 71 to the electrode pattern.

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