| 摘要 |
PROBLEM TO BE SOLVED: To provide stage equipment adaptable to a large stroke system and especially suitable for being mounted on an electron beam lithography system. SOLUTION: The stage equipment comprises an X driver 3 movable along the X direction, a Y driver 2 movable along the Y direction, an XY driver 4 movable along the Y direction through a Y lateral hydrostatic bearing 44 with respect to the X driver and movable along the X direction through an X lateral hydrostatic bearing 45 with respect to the Y driver, and Y lateral and X lateral exhaust grooves formed, respectively, around the Y lateral and X lateral hydrostatic bearings wherein a fluid discharged from the X lateral hydrostatic bearing joins a fluid discharged from the Y lateral hydrostatic bearing before being discharged from an exhaust hole 53" formed in the X driver. COPYRIGHT: (C)2005,JPO&NCIPI |
