| 摘要 |
An apparatus for providing different gases to different zones of a processing chamber comprises a gas supply (1880) for providing an etching gas flow; a flow splitter (1831, 1836 - 1840) in fluid connection with the gas supply for splitting the etching gas flow from the gas supply into a plurality of legs (1812, 1814, 1833, 1834) and a tuning gas system (1860- 1862, 1865 - 1868) in fluid connection to at least one of the legs of the plurality of legs (1812, 1814). |
| 申请人 |
LAM RESEARCH CORPORATION;LARSON, DEAN, J.;KADKHODAYAN, BABAK;WU, DI;TAKESHITA, KENJI;YEN, BI-MING;SU, XINGCAI;DENTY, WILLIAM, M., JR.;LOEWENHARDT, PETER |
发明人 |
LARSON, DEAN, J.;KADKHODAYAN, BABAK;WU, DI;TAKESHITA, KENJI;YEN, BI-MING;SU, XINGCAI;DENTY, WILLIAM, M., JR.;LOEWENHARDT, PETER |
