发明名称 Semiconductor laser, semiconductor device and nitride series III-V group compound substrate, as well as manufacturing method thereof
摘要 A semiconductor laser, a semiconductor device and a nitride series III-V group compound substrate capable of obtaining a crystal growth layer with less fluctuation of the crystallographic axes and capable of improving the device characteristics, as well as a manufacturing method therefor are provided. The semiconductor laser comprises, on one surface of a substrate used for growing, a plurality of spaced apart seed crystal layers and an n-side contact layer having a lateral growing region which is grown on the basis of the plurality of seed crystal layers. The seed crystal layer is formed in that a product of width w1 (unit: mum) at the boundary thereof relative to the n-side contact layer along the arranging direction A and a thickness t1 (unit: mum) along the direction of laminating the n-side contact layer is 15 or less. This can decrease the fluctuation of the crystallographic axes in the n-side contact layer. Accordingly, crystallinity of the semiconductor layer including from n-type clad layer to a p-side contact layer laminated on the n-side contact layer is improved. A semiconductor laser and a semiconductor device capable of decreasing dislocation density and improving device characteristics, as well as a manufacturing method therefor are provided. A semiconductor layer comprising a nitride series III-V group compound semiconductor is laminated on a substrate 11 comprising an n-type GaN. Protruded seed crystal portions are formed and a growth suppression layer having an opening corresponding to the seed crystal portion is disposed to the substrate. The semiconductor layer grows on the basis of the seed crystal portion and has a lateral growing region of low dislocation density. When a current injection region is disposed corresponding to the lateral growing region, the light emission efficiency can be improved. Further, when the growth suppression layer is provided with a function of reflecting or absorbing light generated in the semiconductor layer, it is possible to prevent leakage of light or intrusion of stray light from the substrate to suppress generation of noises.
申请公布号 US2005000407(A1) 申请公布日期 2005.01.06
申请号 US20040909911 申请日期 2004.08.02
申请人 SONY CORPORATION 发明人 TAKEYA MOTONOBU;YANASHIMA KATSUNORI;ASANO TAKEHARU;GOTO OSAMU;IKEDA SHINRO;SHIBUYA KATSUYOSHI;HINO TOMONORI;KIJIMA SATORU;IKEDA MASAO
分类号 H01L21/20;H01L33/00;H01S5/02;H01S5/343;(IPC1-7):C30B15/00;C30B21/06;C30B27/02;C30B28/10;C30B30/04;C30B23/00;C30B25/00;C30B28/12;C30B28/14 主分类号 H01L21/20
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