发明名称 METHOD TO REDUCE ADHESION BETWEEN A CONFORMABLE REGION AND A PATTERN OF A MOLD
摘要 The present invention provides a method to reduce adhesion between a conformable region on a substrate and a pattern of a mold, which selectively comes into contact with the conformable region. The method features forming a conformable material on the substrate and contacting the conformable material with the surface. A conditioned layer is formed from the conformable material. The conditioned layer has first and second sub-portions, with the first sub-portion being solidified and the second sub-portion having a first affinity for the surface and a second affinity for the first sub-portion. The first affinity is greater than the second affinity. In this fashion, upon separation of the mold from the conditioned layer, a subset of the second sub-portion maintains contact with the mold, thereby reducing the probability that a pattern formed in the conditioned layer becomes compromised.
申请公布号 WO2005000552(A2) 申请公布日期 2005.01.06
申请号 WO2004US18857 申请日期 2004.06.10
申请人 MOLECULAR IMPRINTS, INC.;BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM 发明人 CHOI, BYUNG-JIN;XU, FRANK Y.;STACEY, NICHOLAS A.;TRUSKETT, VAN N.;WATTS, MICHAEL P.C.
分类号 B29C;B29C59/00;G03F7/00 主分类号 B29C
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