METHODS, COMPOSITIONS AND DEVICES FOR PERFORMING IONIZATION DESORPTION ON SILICON DERIVATIVES

摘要

Embodiments of the present invention are directed to a substrate for performing ionization desorption on porous silicon, methods for performing such ionization desorption and methods of making substrates. One embodiment directed to a substrate for performing ionization desorption on silicon comprises a substrate having a surface having a formula of: Formula (I); or, Formula (II). As used above, X is H or Y, where at least at least twenty five mole percent of X is Y and Y is hydroxyl, or -O-R1 or O-SiR1,R2,R3 wherein R1, R2 and R3 are selected from the group consisting C1 to C25 straight, cyclic, or branched alkyl, aryl, or alkoxy group, a hydroxyl group, or a siloxane group, where the groups of R1, R2 and R3 are unsubstituted or substituted with one or more moieties such as halogen, cyano, amino, diol, nitro, ether, carbonyl, epoxide, sulfonyl, cation exchanger, anion exchanger, carbamate, amide, urea, peptide, protein, carbohydrate, and nucleic acid functionalities.