PATTERN COMPARISON INSPECTION METHOD AND PATTERN COMPARISON INSPECTION DEVICE

摘要

A pattern comparison inspection device includes: position-to-be-judged selection means (41) for selecting a position-to-be-judged to be judged to be contained or not contained in the inspection area from a certain position on the pattern-to-be-inspected; image comparison means (42) for comparing an image signal of the position-to-be-judged to an image signal at a position at a distance of integral multiple of repetition pitch from the position-to-be judged; and inspection area setting means (43) for setting an inspection area containing the position-to-be-judged in the inspection area when the comparison result of the image comparison means is within a predetermined threshold value. Thus, in the pattern comparison inspection device for inspecting presence/absence of a pattern defect by comparing the repetition patterns in the pattern-to-be-inspected having a repetition pattern area, it is possible to enlarge the inspection area within a range of the repetition pattern area.