METHOD FOR FORMING CONDUCTIVE LAYER PATTERN WITH COBALT BARRIER LAYER TO PREVENT BRIDGE BETWEEN PATTERNS

摘要

PURPOSE: A method for forming a conductive layer pattern with a cobalt barrier layer is provided to prevent a bridge between patterns by effectively eliminating residual cobalt when a cobalt layer is introduced as a barrier layer. CONSTITUTION: A contact hole is formed in an interlayer dielectric. A cobalt layer(300) extends from the bottom of the contact hole to a part on the interlayer dielectric. A conductive layer is formed on the cobalt layer, filling the contact hole and extending to a part on the interlayer dielectric. A protection capping layer(600) is formed on the conductive layer. The protection capping layer and the conductive layer are patterned. The residual cobalt layer exposed by the patterned conductive layer is selectively eliminated by a sputter etch process or an RF plasma etch process.