| 发明名称 |
Lithographic projection apparatus and device manufacturing method |
| 摘要 |
<p>To improve the resolution of lithographic apparatus a sack member is placed between the projection system and the substrate. The sack member can be filled with a fluid of a known refractive index. The sack member should be in contact with both the projection system and the substrate.</p> |
| 申请公布号 |
EP1494075(A1) |
申请公布日期 |
2005.01.05 |
| 申请号 |
EP20030254143 |
申请日期 |
2003.06.30 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
BENSCHOP, JOSEF PETRUS HENRICUS;MULKENS, JOHANNES C.H. |
| 分类号 |
G03F7/20;(IPC1-7):G03F7/20 |
主分类号 |
G03F7/20 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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