| 摘要 |
PURPOSE: An alkali-developable negative type photosensitive resin composition is provided, which is excellent in an adhesive force of thin lines and a resolution, therefore can provide a dry film photoresist capable of forming high resolution pattern. CONSTITUTION: The photosensitive resin composition contains an alkali-soluble binder polymer, a photopolymerizable monomer, a photopolymerization initiator, and additives. The photopolymerizable monomer is a compound(formula 1) having a methacrylate group as a molecular terminal and 5-10 -OH groups on its middle chain, wherein the content of the compound(formula 1) is 10-15wt% based on the total resin composition. In the formula, R is H or CH3 and m is an integer of 5-10.
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