发明名称 |
Chlorine dioxide production plant is operated safely by effecting reaction under water with monitoring of the charges and the chlorine dioxide concentration by conductivity measurements |
摘要 |
<p>A plant for controlled production of chlorine dioxide is such that: (a) a continuous process discharge is applied; (b) dosing of the individual components is monitored qualitatively by conductivity measurements; (c) filling of vessel is controlled by a level monitor; (d) reaction takes place under water and no chlorine gas can be formed; and (e) the chlorine dioxide concentration is checked by conductivity measurements.</p> |
申请公布号 |
DE10326628(A1) |
申请公布日期 |
2005.01.05 |
申请号 |
DE2003126628 |
申请日期 |
2003.06.11 |
申请人 |
IOTRONIC ELEKTROGERAETEBAU GMBH |
发明人 |
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分类号 |
C01B11/02;C02F1/76;(IPC1-7):C01B11/02 |
主分类号 |
C01B11/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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