EXPOSURE METHOD, EXPOSURE DEVICE, AND DEVICE MANUFACTURING METHOD

摘要

According to one embodiment of the invention, an exit portion of a projection optical system PL is filled with a permeable gas which passes an energy beam IL, with a substrate W being a part of a partition, and an object 70 is placed on the exit portion of the projection optical system PL in place of the substrate W at the time of moving the substrate W or replacing the substrate in order to keep a gas state on the exit portion of the projection optical system PL. This can adequately remove a light absorptive substance from the exit portion of the projection optical system and can maintain the gas state even at a time of moving or replacing the substrate.