发明名称 Etching process for making electrodes
摘要 Substantially transparent electrodes are formed on a substrate by a process including forming on the substrate, in order, a bottom high index layer, a metallic conductive layer, and a top high index layer with a conductivity of at least about 400 Omega/square; and chemically etching the bottom high index layer, the top high index layer and the conductive layer to form discrete electrodes in the metallic conductive layer.
申请公布号 US6838013(B2) 申请公布日期 2005.01.04
申请号 US20020170105 申请日期 2002.06.12
申请人 3M INNOVATIVE PROPERTIES COMPANY 发明人 LENNHOFF NANCY S.;RAM JYOTHSNA
分类号 C09K13/04;G02F1/1343;H01L21/306;H01L21/3213;H01L31/18;(IPC1-7):B44C1/22 主分类号 C09K13/04
代理机构 代理人
主权项
地址