发明名称 Method for controlling exposure and scan-exposure apparatus
摘要 The present invention relates to a method for controlling exposure and a scan-exposure apparatus, which are used when a photosensitive material is scan-exposed. In the present invention, distance between a light source and a recording medium can be controlled on the basis of pre-measured distance correction data and timing at which light is emitted from the light source can be controlled on the basis of pre-measured light-emission correction data. Accordingly, it becomes possible to prevent the light beam irradiates the recording medium from going out of focus and to reduce the amount by which the position irradiated with the light beam deviates from a preset standard position.
申请公布号 US6839077(B2) 申请公布日期 2005.01.04
申请号 US20010917880 申请日期 2001.07.31
申请人 FUJI PHOTO FILM CO., LTD. 发明人 IKEMATSU TERUJI
分类号 B41J2/44;B41J2/47;G02B26/10;G03F7/24;H04N1/04;H04N1/23;(IPC1-7):B41J2/435 主分类号 B41J2/44
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