发明名称 |
Chemical mechanical polisher with grooved belt |
摘要 |
A chemical mechanical polishing apparatus has a substrate holder, a polishing belt, and a backing member positioned on a side of the polishing belt opposite the substrate holder. The polishing belt has a polishing surface to contact at least a portion of the substrate held by the substrate holder. The polishing belt is movable in a first direction in a generally linear path relative to the substrate. The polishing belt has a plurality of grooves formed therein.
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申请公布号 |
US6837779(B2) |
申请公布日期 |
2005.01.04 |
申请号 |
US20010851185 |
申请日期 |
2001.05.07 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
SMITH CHRISTOPHER W.;WHITE JOHN M. |
分类号 |
B24B21/04;B24B37/04;B24D11/00;(IPC1-7):B24B21/02 |
主分类号 |
B24B21/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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