发明名称
摘要 An integrated circuit transistor includes an active region in a substrate, elongated along a first direction. A gate pattern is disposed on the substrate and crosses the active region along a second direction transverse to the first direction. The gate pattern includes an access gate portion disposed on the active region and narrowed at a central portion thereof. The gate pattern may further include a pass gate portion adjoining the access gate portion at the point beyond the edge of the active region, the pass gate portion having a lesser extent along the first direction than the access gate portion.
申请公布号 KR100464405(B1) 申请公布日期 2005.01.03
申请号 KR20010078284 申请日期 2001.12.11
申请人 发明人
分类号 H01L27/108;H01L21/28;H01L21/8242;H01L27/02;H01L29/10;H01L29/423 主分类号 H01L27/108
代理机构 代理人
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