APPARATUS FOR IMPROVING PLATING QUALITY BY ACCURATELY MEASURING CONCENTRATION OF ORGANIC ADDITIVES IN PLATING SOLUTION AND SUPPLEMENTING SHORTAGE OF ORGANIC ADDITIVES AT ANY TIME

摘要

PURPOSE: To provide a concentration measuring apparatus capable of constantly maintaining plating quality by precisely monitoring concentration of organic additives in plating solution, particularly accelerator and suppressor at high accuracy and supplementing a shortage of the organic additives at all times. CONSTITUTION: The apparatus for measuring concentration of organic additives in plating solution comprises an eluent bottle(1) for containing at least one or more eluents; a gradient pump(2) for discharging the sucked eluents into the following sample loop by sucking the eluents stored in the eluent bottle; a sample loop(3) for mixing the eluents discharged from the gradient pump with a determined amount of a target sample to be analyzed; a reversed phase column(4) on which an inlet and an outlet are formed, and which discharges the separated organic additives to the outlet by separating the organic additives in a mixed solution prepared by the sample loop; and a detector(5) mounted on the outlet side of the reversed phase column to detect relative ultraviolet ray absorption values of the organic additives.