发明名称 |
VERTICAL DIFFUSION APPARATUS WITH COOLING GAS SUPPLY PART FOR MANUFACTURING SEMICONDUCTOR DEVICE |
摘要 |
PURPOSE: A vertical diffusion apparatus for manufacturing a semiconductor device is provided to perform efficiently a cooling process for a space between an outer tube and an inner tube and the outer tube itself by using a cooling gas supply part. CONSTITUTION: A vertical diffusion apparatus includes an outer tube(20), an inner tube(10) in the outer tube, and a cooling gas supply part(50) between the outer and inner tubes. The cooling gas supply line includes an annular gas supply line(55) for enclosing an upper outer wall of the inner tube or an upper inner wall of the outer tube, and at least one nozzle(57) along the annular gas supply line for spraying a cooling gas.
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申请公布号 |
KR20050000151(A) |
申请公布日期 |
2005.01.03 |
申请号 |
KR20030040739 |
申请日期 |
2003.06.23 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
CHO, SUNG HO;WON, JONG KUK |
分类号 |
H01L21/205;(IPC1-7):H01L21/205 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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