| 摘要 |
<p>PURPOSE: A dimension measuring method, a dimension measuring system, a method of measuring a shape of a photomask pattern and a method of manufacturing the photomask are provided to improve the reliability of measured values by comparing a image obtained from an optical microscope with a simulated image. CONSTITUTION: A first image including a pattern of a photomask is obtained from an optical microscope(S3). By simulating a predetermined image of the optical microscope, a simulated image is obtained from photomask design data corresponding to the first image(S5). The first image is compared with the simulated image based on a determination reference(S6). When the first image is different from the simulated image, pattern dimensions of the photomask design data are revised and the preceding processes are repeated(S7). When the first image is the same as the simulated image, the pattern dimensions of the photomask design data are determined as measured values on dimension(S8).</p> |
