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发明名称
P型半导体元件、P型金氧半导场效电晶体及双闸极氧化物层之方法
摘要
一种半导体装置的形成方法,特别适用于制造P型半导体元件。首先将一具有N型井区之半导体基底进行氯处理与氧化制程,以形成含氯之闸极氧化物层。接着于闸极氧化物层表面覆盖一闸极材料。其次,定义该闸极材料与该闸极氧化物层形成一闸极结构。最后,于该闸极结构两侧之半导底基底上进行掺杂,以形成源极/汲极区。
申请公布号
TW200501413
申请公布日期
2005.01.01
申请号
TW092117372
申请日期
2003.06.26
申请人
台湾积体电路制造股份有限公司
发明人
郝静晨;陈朝祺;沈志恒;谢奇勋
分类号
H01L29/70
主分类号
H01L29/70
代理机构
代理人
洪澄文;颜锦顺
主权项
地址
新竹市新竹科学工业园区园区三路一二一号
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