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发明名称
光束均匀器,雷射照射装置及制造半导体装置之方法
摘要
本发明提供光束均匀器,可形成在长轴方向有均匀能量分布的矩形光束点,而不用需要以高准确度制造的光学透镜。此外,本发明提供雷射照射装置,可照射在长轴方向有均匀能量分布的雷射光束。再者,本发明提供制造半导体装置的方法,可提高基底表面晶性并以高作业特性制造TFT。光束均匀器在表面上形成光束点,照入纵横比为10以上(最好100以上)的矩形点,包括在长轴方向使矩形光束点能量分布均匀的光波导。
申请公布号
TW200500666
申请公布日期
2005.01.01
申请号
TW093110371
申请日期
2004.04.14
申请人
半导体能源研究所股份有限公司
发明人
田中幸一郎;森若智昭
分类号
G02B6/10;G02B27/09
主分类号
G02B6/10
代理机构
代理人
林志刚
主权项
地址
日本
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