| 摘要 |
THIS INVENTION RELATES TO A COMPOSITION FOR CLEANING AND ETCHING THE SURFACE IN FABRICATING ELECTRONIC DISPLAYS AND THE SUBSTRATES. SPECIFICALLY THIS INVENTION RELATES TO A COMPOSITION TO EFFECTIVELY REMOVE THE CONTAMINANTS BY CLEANING, TO REMOVE ANY CONTAMINANTS ON THE SURFACE, AND TO ETCH SIO2 AND SI SUBSTRATE IN THE FABRICATION PROCESS OF ELECTRONIC DISPLAYS, QUARTZ DEVICES, WAFER, AND SEMICONDUCTOR WAFER.ACCORDING TO THIS INVENTION, IT IS POSSIBLE TO CLEAN AND ETCH MORE EFFICIENTLY AND CONVENIENTLY. ALSO THE SUFACE ROUGHNESS IS IMPROVED. FURTHER THE COMPOSITION OF THIS INVENTION CAB BE MADE AVAILABLE IN POWDER TYPE FOR PREPARING A DIFINED AMOUNT OF SOLUTION. IT PROVIDES THE CONVENIENCES IN TRANSPORTATION, HANDLING AND STORAGE.FIG. 1
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