发明名称 ICP ANTENNA AND PLASMA GENERATING APPARATUS USING THE SAME GENERATING UNIFORM HIGH-DENSITY PLASMA
摘要 PURPOSE: An ICP(Inductively Coupled Plasma) antenna and a plasma generating apparatus using the same are provided to generate a uniform high-density plasma and to reduce an internal inductance of the antenna segment. CONSTITUTION: An ICP antenna includes an internal antenna segment(21) and at least one external antenna segment(25). The internal antenna segment has a ring shape. The external antenna segment is implemented substantially at a concentric circle outside the internal antenna segment and is connected in series to the internal antenna segment. At least one of the internal and external antenna segments includes a plurality of circular coils(22,26,27), each of which has a radius different from those of the others. The circular coils are connected in parallel.
申请公布号 KR20040110173(A) 申请公布日期 2004.12.31
申请号 KR20030039365 申请日期 2003.06.18
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 CHO, HYEONG CHEOL;CHOI, JIN HYEOK;HAN, SANG CHEOL;JUN, SANG JIN;KIM, MYEONG UN
分类号 H05H1/46;C23C16/00;H01J37/32;H01L21/304;H01L21/3065;(IPC1-7):H01L21/306 主分类号 H05H1/46
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