发明名称 |
ICP ANTENNA AND PLASMA GENERATING APPARATUS USING THE SAME GENERATING UNIFORM HIGH-DENSITY PLASMA |
摘要 |
PURPOSE: An ICP(Inductively Coupled Plasma) antenna and a plasma generating apparatus using the same are provided to generate a uniform high-density plasma and to reduce an internal inductance of the antenna segment. CONSTITUTION: An ICP antenna includes an internal antenna segment(21) and at least one external antenna segment(25). The internal antenna segment has a ring shape. The external antenna segment is implemented substantially at a concentric circle outside the internal antenna segment and is connected in series to the internal antenna segment. At least one of the internal and external antenna segments includes a plurality of circular coils(22,26,27), each of which has a radius different from those of the others. The circular coils are connected in parallel.
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申请公布号 |
KR20040110173(A) |
申请公布日期 |
2004.12.31 |
申请号 |
KR20030039365 |
申请日期 |
2003.06.18 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
CHO, HYEONG CHEOL;CHOI, JIN HYEOK;HAN, SANG CHEOL;JUN, SANG JIN;KIM, MYEONG UN |
分类号 |
H05H1/46;C23C16/00;H01J37/32;H01L21/304;H01L21/3065;(IPC1-7):H01L21/306 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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