发明名称 POSITIVE RADIATION-SENSITIVE POLYMER COMPOSITION COMPRISING VINYL POLYMER AND 1,2-QUINONEDIAZIDE, THIN FILM USING THE SAME AND DEVICE FORMED BY USING THIN FILM
摘要 PURPOSE: Provided are a positive radiation-sensitive polymer composition capable of being developed with an alkaline solution, a thin film using the same, having high sensitivity, high resolution, excellent leveling, heat-resistance, anti-solvent property and transparency, and a device formed by using the thin film. CONSTITUTION: The positive radiation-sensitive polymer composition comprises a vinyl polymer having at least one of structural units represented by the formula 1, and 1,2-quinonediazide compound. In the formula 1, R1 is a single bond or an alkylene having carbon atoms of 1 to 3, R2 is hydrogen, methyl or chlorine, R3 is hydrogen or an alkyl having carbon atoms of 1 to 3, X is -COO-, -OCO-, -O- or -S-, A is oxetane group represented by the formula (a) or (b), wherein R4 and R5 are independently single bond or an alkylene having carbon atoms of 1 to 3, and R6-R15 are independently hydrogen or an alkyl having carbon atoms of 1 to 3. The thin film for the manufacture of a device is formed of the positive radiation-sensitive polymer composition.
申请公布号 KR20040111179(A) 申请公布日期 2004.12.31
申请号 KR20040045618 申请日期 2004.06.18
申请人 CHISSO CORPORATION 发明人 MITANI, SEIKI;MOMOSE, KEIICHI;SATOU, HIROYUKI;YAMAHIRO, MIKIO
分类号 G03F7/022;(IPC1-7):G03F7/022 主分类号 G03F7/022
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