METHOD OF SELECTIVE ELECTROCHEMICAL ETCHING FOR ANALYZING TWO DIMENSIONAL DOPANT DISTRIBUTION OF SLICE TO BE TESTED HAVING ALUMINIUM LAYER AT BOTTOM PORTION THEREOF

摘要

PURPOSE: A method of selective electrochemical etching for analyzing a two dimensional dopant distribution is provided to improve reproductivity of the doping distribution by providing a hole current from an Al contact layer at a bottom portion of a slice to be tested. CONSTITUTION: A bath contains facing electrodes and an etchant. A sample to be tested(100) includes at least one doping region and is electrically biased on a surface of the bath. A bias voltage is applied to a bottom of the sample to be tested facing a side of the doping region such that a hole current is supplied from the bottom portion of the sample to be tested.