发明名称 ADVANCED ION BEAM MEASUREMENT TOOL FOR AN ION IMPLANTATION APPARATUS
摘要 An array of high aspect openings enables fast and accurate measurement of incidence angle deviation and/or beam divergence. The high aspect ratio assures that only ions of a predefined small incidence angle range may reach a conductive detection surface, thereby allowing efficient control of the ion beam parallelism by maximizing the beam current through the high aspect ratio openings. Moreover, if the array of openings is provided with individual beam current measurement points, spatially resolved intensity measurements may be performed that allow estimation of the beam shape. Thus, a movable Faraday cup assembly may be replaced with the stationary array of high aspect ratio openings, thereby improving tool reliability.
申请公布号 US2004262532(A1) 申请公布日期 2004.12.30
申请号 US20040784510 申请日期 2004.02.23
申请人 KRUEGER CHRISTIAN 发明人 KRUEGER CHRISTIAN
分类号 H01J37/244;(IPC1-7):H01J37/244 主分类号 H01J37/244
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