| 摘要 |
Provided are a plasma source coil for generating plasma and a plasma chamber using the same. The plasma source coil receives power from a power supplier to generate uniformly plasma in a predetermined reaction space. The plasma source coil includes m (here, m>=2, and m is an integer) unit coils, each of which has a number n of turns (here, n is a positive real number). The unit coils extend from a coil bushing, which is located in the center of the plasma source coil and has a predetermined radius, and are arranged in a spiral shape around the coil bushing.
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