发明名称 Semiconductor apparatus including a thin-metal-film resistor element and a method of manufacturing the same
摘要 A semiconductor apparatus includes a wiring pattern, an insulating film, and a thin-metal-film resistor element. The insulating film is formed on the wiring pattern having connection holes vertically penetrating there-through to expose part of the wiring pattern at bottom regions of the connection holes. The connection holes are arranged with a space there-between. The thin-metal-film resistor element is formed on the insulating film and extending to continuously overlay and contact surfaces of the insulating film, inner walls of the connection holes, and the wiring pattern at the bottom regions of the connection holes.
申请公布号 US2004262709(A1) 申请公布日期 2004.12.30
申请号 US20040861931 申请日期 2004.06.07
申请人 YAMASHITA KIMIHIKO;HASHIMOTO YASUNORI 发明人 YAMASHITA KIMIHIKO;HASHIMOTO YASUNORI
分类号 H01L21/768;H01C7/00;H01C17/075;H01L21/822;H01L23/522;H01L27/04;(IPC1-7):H01L29/00 主分类号 H01L21/768
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