| 发明名称 |
Aqueous buffered fluoride-containing etch residue removers and cleaners |
| 摘要 |
The invention relates to aqueous, buffered, fluoride containing compositions having a pH of greater than 7.0 to about 11.0. In certain embodiments, the buffered compositions have an extended worklife because pH dependent attributes such as oxide and metal etch rates are stable so long as the pH remains stable.
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| 申请公布号 |
US2004266637(A1) |
申请公布日期 |
2004.12.30 |
| 申请号 |
US20040877305 |
申请日期 |
2004.06.25 |
| 申请人 |
ROVITO ROBERTO J.;RIEKER JENNIFER M.;PETERS DARRYL W. |
发明人 |
ROVITO ROBERTO J.;RIEKER JENNIFER M.;PETERS DARRYL W. |
| 分类号 |
G03F7/42;C11D7/08;C11D7/10;C11D7/26;C11D7/28;C11D7/32;C11D7/34;C11D7/50;C11D7/60;H01L21/027;H01L21/304;(IPC1-7):A61K7/18 |
主分类号 |
G03F7/42 |
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