发明名称 Preparation of electroless deposition solutions
摘要 A system and method for storing a solution containing a subset of a group consisting of a metal ion, a complexing agent, an ammonium salt, and a strong base and then nearer to a time of use in an electroless deposition process, using the solution to form an electroless deposition solution containing the entire group. In one embodiment of the invention, the metal ion includes a cobalt ion, the complexing agent includes citric acid, the ammonium salt includes ammonium chloride, and the strong base includes tetramethylammonium hydroxide.
申请公布号 US2004265501(A1) 申请公布日期 2004.12.30
申请号 US20030609443 申请日期 2003.06.26
申请人 INTEL CORPORATION 发明人 CHOI HOK-KIN;THIRUMALA VANI;BUBIN VALERY;CHENG CHIN-CHANG;ZHONG TING
分类号 C23C18/16;C23C18/31;C23C18/50;(IPC1-7):C23C18/31;C23C18/32 主分类号 C23C18/16
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