| 摘要 |
An apparatus is provided. The apparatus comprises a chamber for loading a substrate therein, a plasma creation area in the chamber, first and second electrodes installed in the chamber, and a power source for supplying a radio frequency to the first electrode. The first electrode includes a plurality of areas having different resistances for varying the radio frequency applied to the plasma creation area. The upper electrode makes a plasma density uniform to enhance a process uniformity.
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