| 摘要 |
In a method for testing an operation state of an electron beam inspection apparatus, an electron beam sequentially scans a plurality of scan lines in a predetermined inspection area on a substrate. A detector detects secondary electrons emitted from the scan lines and an image acquisition unit acquires inspection images corresponding to the scan lines from the secondary electrons. An image processing unit analyzes the inspection images using an initial sensitivity in order to detect defects on the scan lines. A graphic unit produces an inspection graph indicating the number of defects and an operation unit compares the inspection graph with a reference graph. A compensator compensates a sensitivity difference corresponding to a difference between the inspection graph and the reference graph.
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