发明名称 Method and apparatus for removing a target layer from a substrate using reactive gases
摘要 A system and method for removing a layer from a substrate surface is provided. The method includes providing at least one encapsulating transport, where the encapsulating transport contains at least some reactive gas. At least one encapsulating transport is applied to the layer, and the layer is a chemically reactive layer. The encapsulating transport ruptures on the chemically reactive layer and releases the reactive gas in combination with a reaction inducing agent onto the chemically reactive layer to facilitate removal of the layer from the substrate surface.
申请公布号 US2004261823(A1) 申请公布日期 2004.12.30
申请号 US20030608871 申请日期 2003.06.27
申请人 LAM RESEARCH CORPORATION 发明人 DE LARIOS JOHN M.
分类号 G03F7/42;H01L21/00;H01L21/306;H01L21/311;(IPC1-7):B08B5/00 主分类号 G03F7/42
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