Lithographic projection apparatus and device manufacturing method

摘要

The apparatus has a vacuum chamber (5) with patterning unit e.g. mask and mask table (MA, MT) for patterning a projection beam according to a desired pattern. A projection lens projects the patterned beam onto a target portion of a substrate (W). A thermal shield (6) has particle transmission channels (9) for transmitting particles from one side of the shield to the other side to condition the unit and the lens. An independent claim is also included for a device manufacturing method.