发明名称 |
Positive-working resist composition |
摘要 |
A positive-working resist composition comprising (A) a resin that increases solubility in an alkali developing solution by the action of an acid, (B) a compound which generates an acid upon irradiation of an actinic ray or radiation, (C) a nonionic cyclic compound having at least one partial structure represented by the following formula (I) or (II) and at least having either a melting point of 35°C or more or a boiling point of 100°C/10 mmHg or more:
and (D) a solvent.
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申请公布号 |
EP1491951(A2) |
申请公布日期 |
2004.12.29 |
申请号 |
EP20040013659 |
申请日期 |
2004.06.09 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
TAKAHASHI, HYOU;YAMANAKA, TSUKASA;FUJIMORI, TORU |
分类号 |
G03F7/039;G03F7/004;(IPC1-7):G03F7/004 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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