发明名称 Calibration method for a lithographic apparatus
摘要 <p>The method involves calculating a calibration that establishes a relationship between coordinates of a coordinate system of a programmable mirror array (PPM) and coordinates of the coordinate system of a substrate table. The calibration is calculated based on detected radiation intensity and positions of the array of individually controllable units and the substrate table. Independent claims are also included for the following: (a) a lithographic apparatus manufacturing method (b) a computer program for controlling a lithographic apparatus, comprising code unit for performing a calibration method.</p>
申请公布号 EP1491966(A1) 申请公布日期 2004.12.29
申请号 EP20040253685 申请日期 2004.06.18
申请人 ASML NETHERLANDS B.V. 发明人 BLEEKER, ARNO JAN;VAN BUEL, H. W. M.;LOF, JOERI
分类号 G03F7/20;G03F9/00;(IPC1-7):G03F7/20 主分类号 G03F7/20
代理机构 代理人
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