发明名称 Coil for plasma generating source
摘要 <p>The coil has a unit coil structured such that an interval between portions of the unit coil in x direction decreases as a radial distance from a center of a coil bushing (210) increases in the x direction. The interval increases as the radial distance decreases. An interval between currents flowing through the coil becomes narrower as the coil extends farther from the center of the coil bushing in a radial direction. An independent claim is also included for a plasma chamber comprising a plasma source coil.</p>
申请公布号 EP1492154(A2) 申请公布日期 2004.12.29
申请号 EP20040102994 申请日期 2004.06.28
申请人 ADAPTIVE PLASMA TECHNOLOGY CORPORATION 发明人 KIM, NAM HUN;KIM, JOON HUN
分类号 H05H1/46;H01J37/32;H01L21/205;H01L21/3065;(IPC1-7):H01J37/32 主分类号 H05H1/46
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