发明名称 Method of measuring aberration in an optical imaging system
摘要 A method of determining aberration of an optical imaging system comprises measuring at least one parameter, such as position of best-focus and/or lateral position, of an image formed by the imaging system. This is repeated for a plurality of different illumination settings of the imaging system, and from these measurements at least one coefficient, representative of aberration of said imaging system, is calculated. <IMAGE>
申请公布号 EP1128217(A3) 申请公布日期 2004.12.29
申请号 EP20010301571 申请日期 2001.02.21
申请人 ASML NETHERLANDS B.V. 发明人 VAN DER LAAN, HANS;MOERS, MARCO HUGO PETRUS
分类号 G03F7/20 主分类号 G03F7/20
代理机构 代理人
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