发明名称 Resonantly enhanced photosensitivity
摘要 <p>A resonant enhanced photosensitive material has trap center adapted to interact with light and enhances photosensitivity of the material based on resonant interaction process with photons. Independent claims are also included for: (1) a method of enhancing photosensitivity in photosensitive material comprising introducing dopants into the material, the dopants providing real electronic states with an energy above the ground state, the energy being a multiple n of the energy individual photons in light beam used to create photosensitivity effect, with n being an integer greater than 1; and (2) a method of generating photonic interaction in photosensitive material comprising directing first laser light beam into the material, the beam providing photons interacting with trap centers in the material, the interaction assisting a transition from ground to energetic intraband state.</p>
申请公布号 EP1491514(A1) 申请公布日期 2004.12.29
申请号 EP20040002379 申请日期 2004.02.03
申请人 SCHOTT AG 发明人 HAYDEN, JOSEPH S., DR.;SCHREDER, BIANCA;ZIMMER, JOSE, DR.
分类号 C03C3/095;C03C4/04;C03C10/00;C03C23/00;(IPC1-7):C03C3/095;C04B35/14 主分类号 C03C3/095
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