发明名称 Laser-produced plasma EUV light source with pre-pulse enhancement
摘要 <p>The source (50) has laser sources generating main pulse and pre-pulse laser beams (52, 54), respectively that are timed so that the pre-pulse beam arrives at a target area (56) before the arrival of main pulse beam. A controller (74) sets the timing between the beams to be less than 160 nanoseconds to control the intensity of a radiation. The beams are separated by an angle in the range of 0 to 180 degrees at the target area.</p>
申请公布号 EP1492394(A2) 申请公布日期 2004.12.29
申请号 EP20030026665 申请日期 2003.11.19
申请人 UNIVERSITY OF CENTRAL FLORIDA FOUNDATION, INC. 发明人 HARTLOVE, JEFFREY S.;MICHAELIAN, MARK E.;SHIELDS, HENRY;TALMADGE, SAMUEL;FORNACA, STEVEN W.;MARTOS, ARMANDO
分类号 G21K5/00;G21K5/02;H01L21/027;H05G2/00;H05H1/24;(IPC1-7):H05G2/00 主分类号 G21K5/00
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