Laser-produced plasma EUV light source with pre-pulse enhancement
摘要
<p>The source (50) has laser sources generating main pulse and pre-pulse laser beams (52, 54), respectively that are timed so that the pre-pulse beam arrives at a target area (56) before the arrival of main pulse beam. A controller (74) sets the timing between the beams to be less than 160 nanoseconds to control the intensity of a radiation. The beams are separated by an angle in the range of 0 to 180 degrees at the target area.</p>
申请公布号
EP1492394(A2)
申请公布日期
2004.12.29
申请号
EP20030026665
申请日期
2003.11.19
申请人
UNIVERSITY OF CENTRAL FLORIDA FOUNDATION, INC.
发明人
HARTLOVE, JEFFREY S.;MICHAELIAN, MARK E.;SHIELDS, HENRY;TALMADGE, SAMUEL;FORNACA, STEVEN W.;MARTOS, ARMANDO