IMPRINT LITHOGRAPHY WITH IMPROVED MONITORING AND CONTROL AND APPARATUS THEREFOR

摘要

In accordance with the invention, at least one parameter of a method for imprinting a mold pattern on the surface of a workpiece is monitored or measured. The monitoring or measuring is accomplished by a) providing a mold having a molding surface configured to imprint at least a test pattern for measurement; b) imprinting the test pattern on the moldable surface by pressing the molding surface into the moldable surface; c) illuminating the test pattern with radiation during at least a portion of the imprinting, and monitoring or measuring at least one component of the radiation scattered, reflected or transmitted from the test pattern to monitor or measure the at least one parameter of the imprinting. The imprinting step typically comprises disposing the mold near the workpiece with the molding surface adjacent the moldable surface, pressing the molding surface into the moldable surface and removing the molding surface from the moldable surface to leave the imprinted pattern. In many cases, the pressing can be facilitated by heating the moldable surface, and retention of the imprinted pattern can be assisted by cooling or curing the deformed surface material. Moreover the process can be controlled by detecting the component of the radiation, generating a feedback control signal from the detected signal, and using the feedback control signal to control the imprint process in real time. The invention also includes advantageous apparatus for the above methods of monitoring, measuring and controlling imprint lithography.