发明名称 METHOD AND SYSTEM FOR FABRICATING NANOSCALE PATTERNS IN LIGHT CURABLE COMPOSITIONS USING AN ELECTRIC FIELD
摘要 A high-throughput lithography process for creating high-resolution patterns in a polymerizable composition using carefully controlled electric fields followed by curing of the polymerizable composition is described. The process involves the use of a template that includes the desired patterns. This template is brought into close proximity to the polymerizable composition on the substrate. An external electric field is applied to the template-substrate interface while maintaining a uniform, carefully controlled gap between the template and substrate. This causes the polymerizable composition to be attracted to the raised portions of the template. By appropriately choosing the various process parameters such as the viscosity of the polymerizable composition, the magnitude of the electric field, and the distance between the template and substrate, the resolution of the structures formed in the liquid may be controlled to conform to that of the template.
申请公布号 WO2004063815(A3) 申请公布日期 2004.12.29
申请号 WO2002US15551 申请日期 2002.05.16
申请人 UNIV TEXAS 发明人 WILLSON C GRANT;SREENIVASAN S V;BONNECAZE ROGER T
分类号 G03F7/26;G03F7/00;H01L21/027 主分类号 G03F7/26
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