发明名称 |
Apparatus for and method of polishing workpiece |
摘要 |
A polishing apparatus for polishing a workpiece such as a semiconductor wafer (4) has a turntable (5) with an abrasive cloth (6) mounted on an upper surface thereof, and a top ring (1) for holding a workpiece (4) and pressing the workpiece (4) against the abrasive cloth (6) under a first pressing force to polish the workpiece (4). A guide ring (3) is vertically movably disposed around the top ring (1), and pressed against the abrasive cloth (6) under a variable second pressing force. The first and second pressing forces are variable independently of each other, and the second pressing force is determined based on the first pressing force. |
申请公布号 |
EP1170090(B1) |
申请公布日期 |
2004.12.29 |
申请号 |
EP20010122244 |
申请日期 |
1996.10.09 |
申请人 |
EBARA CORPORATION |
发明人 |
KIMURA, NORIO;YASUDA, HOZUMI |
分类号 |
B24B37/005;B24B37/04;B24B37/30;B24B37/32;(IPC1-7):B24B37/04 |
主分类号 |
B24B37/005 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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