Lithographic apparatus and device manufacturing method

摘要

The apparatus has an intensity adjustment device (10) disposed in a radiation system and comprising blades (11) with blind parts that are located to cast penumbras in a central part of an illumination field. The penumbras are symmetric in a scanning direction about a center line of the illumination field. The blades are rotatable to vary their effective area in a projected beam (PB). An independent claim is also included for a device manufacturing method.