| 发明名称 |
Micro device and process for producing it |
| 摘要 |
Micro device comprises at least one layer of SU-8(RTM; epoxy photoresist) that is adhered to a clamping layer with through holes. The holes are filled with SU-8(RTM; epoxy photoresist) and are covered on both sides with SU-8(RTM; photoresist). An independent claim is included for producing the micro device. |
| 申请公布号 |
EP1491950(A1) |
申请公布日期 |
2004.12.29 |
| 申请号 |
EP20030014140 |
申请日期 |
2003.06.24 |
| 申请人 |
NANOWORLD AG |
发明人 |
DETTERBECK, MANFRED;LUTTER, STEFAN;BURRI, MATHIEU;HARTMANN, THEO;AKIYAMA, TERUNOBU |
| 分类号 |
B81C1/00;B81B3/00;C23F1/40;G03F7/00;G03F7/16 |
主分类号 |
B81C1/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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