POSITIVE RESIST COMPOSITION

摘要

A positive resist composition which comprises (A) a base resin component having an acid-dissociative dissolution inhibiting group and increasing in the solubility into an alkaline solution, and (B) a component generating an acid by the irradiation with a radiation, wherein the (A) component exhibits an absorbance at 193 nm of 1.0 (1/mum) or less and has a molecular weight distribution (Mw/Mn) of 1.5 or less. The positive resist composition exhibits excellent resolving characteristics and a wide PEB margin.