发明名称 |
Window for allowing end point of etching process to be detected and etching device comprising the same |
摘要 |
An end point detection window prevents process failures in a plasma etching device. The end point detection window has a body of aluminum or an aluminum alloy through which a hole extends to provide a path along which light generated during the etching process can pass from the process chamber, and a capping section coupled to a light outlet of the body. The capping section is of quartz for allowing the light passing through the hole in the body to be transmitted out of the process chamber.
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申请公布号 |
US6835276(B2) |
申请公布日期 |
2004.12.28 |
申请号 |
US20020246674 |
申请日期 |
2002.09.19 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
HWANG JUNG-HYUN;HUH NO-HYUN;CHOI CHANG-WON;CHOI BYEUNG-WOOK;LEE DOO-WON |
分类号 |
C23F4/00;H01J37/32;H01L21/00;H01L21/3065;H01L21/66;(IPC1-7):H05H1/00;C23C16/00 |
主分类号 |
C23F4/00 |
代理机构 |
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代理人 |
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主权项 |
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